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Tokyo Electron Limited (OTCMKTS:TOELY) Sees Large Increase in Short Interest

Tokyo Electron logo with Computer and Technology background

Tokyo Electron Limited (OTCMKTS:TOELY - Get Free Report) was the recipient of a large increase in short interest in the month of January. As of January 15th, there was short interest totalling 92,200 shares, an increase of 94.1% from the December 31st total of 47,500 shares. Based on an average trading volume of 254,700 shares, the days-to-cover ratio is currently 0.4 days.

Tokyo Electron Price Performance

TOELY traded up $1.46 during trading on Friday, hitting $84.48. The stock had a trading volume of 152,054 shares, compared to its average volume of 176,183. The company has a 50 day moving average price of $79.87 and a 200-day moving average price of $83.60. Tokyo Electron has a one year low of $68.83 and a one year high of $134.91. The firm has a market cap of $77.84 billion, a price-to-earnings ratio of 31.52 and a beta of 1.51.

Tokyo Electron (OTCMKTS:TOELY - Get Free Report) last posted its earnings results on Tuesday, November 12th. The company reported $0.86 earnings per share for the quarter. Tokyo Electron had a return on equity of 24.79% and a net margin of 21.32%. The company had revenue of $3.81 billion during the quarter, compared to the consensus estimate of $3.70 billion. As a group, sell-side analysts predict that Tokyo Electron will post 3.23 EPS for the current fiscal year.

Analyst Upgrades and Downgrades

Separately, Sanford C. Bernstein upgraded shares of Tokyo Electron to a "strong-buy" rating in a research report on Monday, October 7th.

Read Our Latest Stock Analysis on Tokyo Electron

Tokyo Electron Company Profile

(Get Free Report)

Tokyo Electron Limited, together with its subsidiaries, develops, manufactures, and sells semiconductor and flat panel display (FPD) production equipment in Japan, Europe, North America, Taiwan, China, South Korea, Southeast Asia, and internationally. The company offers coaters/developers, etch systems, surface preparation systems, deposition systems, test systems, wafer bonders/debonders, wafer edge trimming, SiC epitaxial CVD systems, gas cluster ion beam system, and cleaning systems.

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